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All Products / Optics / Optical Mirrors / Ultrafast Laser Mirrors / UltraFast Innovations (UFI) 780 and 800nm Highly-Dispersive Ultrafast Mirrors
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12.7mm Dia. 5°, 800nm Highly-Dispersive Ultrafast Mirror

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UltraFast Innovations (UFI) 800nm Highly-Dispersive Ultrafast Mirrors

UltraFast Innovations (UFI) 800nm Highly-Dispersive Ultrafast Mirrors UltraFast Innovations (UFI) 800nm Highly-Dispersive Ultrafast Mirrors
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Stock #12-330 3-4 days
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£200.43 £334.05
Qty 1-3
£200.43 £334.05
Qty 4+
£176.97 £294.95
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Type:
Laser Mirror
Wedge (arcmin):
10 ±5
Clear Aperture (%):
80
Back Surface:
Commercial Polish
Reflection at DWL (%):
>99.9% (typical, p-polarization)
Coating Specification:
Ravg >99.8%, GDD = -1300 fs2 @ 780 - 830nm (p-polarization)
Rabs >99.9% @ 800nm (typical, p-polarization)
GDD Specification:
-1300fs2 @ 780 - 830nm
Wavelength Range (nm):
780 - 830
Irregularity (P-V) @ 632.8nm:
λ/10
Coating Type:
Dielectric
Coating:
Ultrafast (780-830nm)
Design Wavelength DWL (nm):
800
Diameter (mm):
12.70 +0.0/-0.1
Thickness (mm):
6.35 ±0.2
Angle of Incidence (°):
5
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica (Corning 7980)
Damage Threshold, By Design: Damage threshold for optical components varies by substrate material and coating. Click here to learn more about this specification.
0.3 J/cm2 @ 800nm, 50fs, 1kHz, 100μm Beam Diameter

Regulatory Compliance

RoHS 2015:
Compliant
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Certificate of Conformance:
View
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Reach 235:
Compliant
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Product Family Description

  • Reflection >99.8% (P-polarization) at 720 – 840nm or 780 – 830nm
  • Low Group Delay Dispersion at 5° or 20° AOIs 
  • Ideal for Pulse Compression of Ti:sapphire Ultrafast Lasers
  • Low GDD Mirrors Also Available

UltraFast Innovations (UFI) 780 and 800nm Highly-Dispersive Ultrafast Mirrors feature an optimized multilayer ultrafast chirped coating based on dispersive optical interference that provides a low group delay dispersion (GDD) and high reflectance. These ultrafast mirrors provide GDDs as low as -1300fs2 and greater than 99.8% reflectivity for p-polarization. The highly-dispersive design of these ultrafast mirrors offers control of third and higher order dispersions, and provides high beam stability at either 5° or 20° angle of incidence. UltraFast Innovations (UFI) 780 and 800nm Highly-Dispersive Ultrafast Mirrors are ideal for pulse compression and dispersion compensation of ultrafast pulses, such as Ti:sapphire lasers. Standard imperial sizes are available, featuring fused silica substrates.