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All Products / Laser Optics / Laser Mirrors / Laser Line Mirrors / Yb-Doped Dichroic Mirrors
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25mm Dia., Low GDD 940/1030nm Yb-Doped Dichroic Mirrors

Yb-Doped Dichroic Mirrors

Yb-Doped Dichroic Mirrors

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Stock #28-972 New 3-4 days
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£468.39
Qty 1-5
£468.39
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£398.35
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Specifications

General

Type:
High Power Dichroic Window

Physical & Mechanical Properties

Diameter (mm):
25.00 +0.0/-0.10
Clear Aperture CA (mm):
22.50
Thickness (mm):
3.00 ±0.20
Edges:
Fine Ground

Optical Properties

Design Wavelength DWL (nm):
940nm/1030nm
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica (Corning 7980)
Angle of Incidence (°):
0 - 5
Coating:
S1: HR 1030nm ± 5nm, AR 940 ± 5nm
S2: AR 940nm & 1030nm ± 5nm
Coating Specification:
S1: Rp & Rs >99.5% @ 1030nm;
Tp & Ts >98% @ 940nm @ 0 – 5° AOI
S2: Tp & Ts >98% @ 940nm & 1030nm
Index of Refraction (nd):
1.458
Surface Flatness (P-V):
λ/10
Surface Quality:
10-5
Wedge Angle:
30' ±10'
Damage Threshold, Reference: Damage threshold for optical components varies by substrate material and coating. Click here to learn more about this specification.
> 20 J/cm2 @ 10ns pulses @5 kHz PRF
1MW/cm2 CW

Regulatory Compliance

RoHS:
Compliant
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Certificate of Conformance:
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Product Details

  • High Reflectivity at 1030nm and High Transmission at 940nm
  • Low Group Delay Dispersion (GDD) <±100fs2
  • Dichroic Mirror Ideal for Ytterbium (Yb) Lasers

Yb-Doped Dichroic Mirrors feature a high reflectivity of 99.5% at 1030nm and transmission of 98% at 940nm with wide acceptance angles of 0 – 5°. Featuring wedged substrates that minimize back reflections even at 0° AOI, these mirrors eliminate unwanted feedback in laser systems and are available in either 12.5, 25, or 50mm diameters with a thickness of 3mm. Designed for high power applications utilizing nanosecond pulses, these mirrors are ideal for precision material processing. Yb-Doped Dichroic Mirrors also offer a Low Group Delay Dispersion (GDD) of <±100fs2 from 1030nm – 1080nm, making them useful for ultrafast and nonlinear applications including multi-photon microscopy.

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